RCM2800-20G 800 W GaN Microwave Generator for Plasma and Industrial CVD
High-precision motion control with Bogen Magnetics’ miniaturized sensors
Greater Control and Stability in Plasma, CVD, and Heating Systems
In many industrial applications, the RF generator architecture is critical. Factors such as frequency stability and energy efficiency can determine the difference between a profitable process and an inefficient one. The new RFHIC RCM2800-20G is designed specifically for these demanding environments. This solid-state generator, based on GaN technology, can deliver up to 800 W in the ISM band, providing precise control for semiconductor systems.
RCM25800-20G: Power and Precision in Solid-State
The RCM25800-20G operates as a modular CW and pulsed generator. This device allows output power adjustment from 10 W to 800 W in steps of just 1 W. It is built with next-generation GaN-on-SiC HEMT transistors, achieving up to 55% DC-RF efficiency with high power density.
Additionally, the system integrates an internal PLL synthesizer. This feature eliminates the need for external sources and enables digital phase and frequency control. It also includes an automatic frequency sweep function, which is essential for minimizing reflected power in variable loads such as plasmas or resonant cavities.
Regarding its physical design, the unit operates at 50 VDC and uses liquid cooling. Its compact form factor greatly simplifies integration into industrial racks. Consequently, it includes alarms and protections for overtemperature and reflected power, ensuring full operational reliability in 24/7 working environments.
Real-World Applications and Benefits
This solid-state generator combines longer lifetime and lower maintenance with precise, repeatable control of power and frequency, providing greater process stability and superior energy efficiency. Its advanced design allows for easy integration into automated systems, making it a robust and scalable solution for industrial equipment manufacturers seeking long-term performance and reliability.
The generator’s spectral stability reduces arc instabilities and significantly improves process repeatability, while fine frequency control optimizes deposition uniformity in CVD systems and minimizes production deviations. In industrial heating applications, GaN-on-SiC efficiency reduces thermal losses, contributing to more economical and sustainable operation.
Thanks to all these advantages, this module is ideal for plasma generation, Microwave CVD equipment, microwave drying, or as a core module in high-power systems, delivering consistent, uniform, and efficient results in every application. Additionally, the unit is ready for modern architectures with EtherCAT communication, facilitating integration into next-generation automated systems.
RC Microelectrónica: Official RFHIC Distributor in Spain
At RC Microelectrónica, we are experts in the distribution of power electronic components. We work closely with RFHIC to support our clients in integrating advanced RF solutions. If you are developing plasma equipment or heating systems, our technical team can provide guidance. Contact us to review your application and define the most suitable RF architecture for your project.
